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Input Power
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1, 108V-220 VA, 50/60Hz, single phase
2, 800 W (including pump)
3, If the voltage is 110 VAC, a 1000 W transformer is required, please click the left picture to order
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Source Power
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1, One 13.5 MHz, 300 W RF Generator with automatic matching function is built in cabinet and connected to 2" sputtering head
2, Optional: DC sputtering power source is available for coating metallic material
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Magnetron Sputtering Head
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1, One 2" Magnetron Sputtering Heads with water cooling jackets are included and inserted into quartz chamber via a quick clamp
2, One shutter is built on the flange (manually operated)
3, One 16 L/min digitally controlled recirculation water chiller is required for cooling magnetron sputtering heads
4, 1" sputtering head is replaceable and optional at extra cost
5, 148 cm RF cable is replaceable with extra cost
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Sputtering Target
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1. Target size requirement: 2" diameter x 1/4"thickness Max
2. One SiO2 target is included for demo test.
3. Al2O3 ceramic target Recommend Coating Method
4. Optional 2" sputtering targets (with backing plate) are available upon request at extra cost.
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Vacuum Chamber
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1, Vacuum Chamber: 160 mm OD x 150 mm ID x 250 mm Height. made of high purity quartz
2, Sealing Flange: 165 mm Dia. made of Aluminum with high-temperature silicone O-ring
3, Stainless steel mesh cover is included for 100% shielding RF radiation from the chamber
4, Vacuum level: 1.0E-2 Torr with included dual stage mechanical pump and 1.0E-5 Torr with optional turbopump
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Sample Holder
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1, The sample holder is rotatable and heat-able made of a ceramic heater with stainless steel cover
2, The sample holder size: 50 mm Dia. for 2" wafer max
3, Rotation speed is adjustable: 1 - 10 rpm for uniform coating
4, The holder temperature is adjustable from RT to 500°C Max with accuracy +/- 1.0 °C via digital temperature controller.
5, 800- 1000ºC heating sample holder is available upon request upon request.
6, Optional vibration sample hold is available for power PVD coating.
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Vacuum Pump Station
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1, KF25 Vacuum port is built in for connecting to a vacuum pump.
2, A vacuum pump with KF25 adaptor is required, but not included.. Please click picture to order separately.
3,Vacuum level: 1.0E-2 Torr with dual stage mechanical pump and 1.0E-5 Torr with the turbopump
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Optional
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Precision quartz thickness sensor is optional, which can be built into the chamber to monitor coating thickness with the accuracy of 0.10 Å. The laptop is required for display thickness corve
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Net Weight
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70KG
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Warranty & Compliance
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1, One year limited warranty with lifetime support
2, CE certified
3, NRTL or CSA certification is available upon request at the extra cost
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Application Notes
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1, This compact 2" RF magnetron sputtering coater is designed for coating oxide thin films on oxide single crystal substrates, which usually does not need high vacuum set-up
2, Please use > 5N purity Ar gas for plasma sputtering
3, For the best film-substrate adhesion strength, please clean the substrate surface before coating:
a, Ultrasonic cleaning with the following sequential baths - (1) acetone, (2) isopropyl alcohol - to remove oil and grease. Blow dry the substrate with N2, then hot bake in vacuum to remove absorbed moisture
b, Plasma cleaning may be needed for surface roughening, surface chemical bonds activation, or additional contamination removal
c, A thin buffer layer (~5 nm), such as Cr, Ti, Mo, Ta, could be applied to improve adhesion of metals and alloys
4, For the best performance, the non-conductive targets must be installed with a copper backing plate.
5, OLT uses the Coaters have successfully coated ZnO on Al2O3 substrate at 500 °C
6, DO NOT use tap water in water chiller. Use DI water, distilled water, or anti-corrosive additives as colant.
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