Custom polished aluminum nitride thin-film ceramic sheet
Production Description:
Thin-film technology uses semiconductor and microsystem technology processes to produce circuit boards on ceramic or organic materials.Aluminum nitride thin film ceramic has the advantages of good conductivity, good air tightness, good high temperature stability, and high adhesion strength to ceramic substrate, and is widely used in the field of optical communication packaging.
Our Aluminum Nitride substrates (AlN) are available in various sizes and thicknesses. Thanks to a large and live inventory, we can ship your part fast for you to start your project.
Our Service:
Please contact us for customization.
Specification:
Dimension(LxW) |
50.8*50.8mm, 114.3*114.3mm etc. |
Thickness |
0.1-1.5mm |
Thermal Conductivity |
170-230 W/m.k |
Dielectric Constant |
8-9(MHz) |
Bulk Density |
3.3 g/m³ |
Surface Roughness |
Ra ≤0.03 μm on both sides |
Company Advantage:
Huaqing founded in 2004 with sum investment 80Million RMB, registered capital 40Million RMB. Huaqing's AlN & Al2O3 ceramic products have high thermal-conductivity, low dielectric constant, good dissipation factor and excellent mechanical property compared with the other factories in the industry. AlN & Al2O3 ceramic are widely used in HBLED, opto-communication, IGBT, power devices, TEC and the other high-end applications.
Workshop & Equipment:
Packaging & Delivery:
Deliver by UPS,DHL,Fedex etc.