Dual-Target DC Magnetron Sputtering Coater
Dual-target DC magnetron sputtering coater is equipped with two 500W DC power supply. The DC power supply can be used for the preparation of metal film. The two targets can meet the needs of multi-layer or multiple coatings.
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Sample stage
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Size
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φ185mm
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Temperature control accuracy
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±1℃
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Heating temperature
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Max 500℃
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Rotate speed
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1-20rpm adjustable
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Magnetron Sputtering target head
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Quantity
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2”×2 (1”,2” optional)
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Water chiller
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Circulating water chiller with flow rate of 10L/min
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Cooling mode
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Water cooling
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Vacuum chamber
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Chamber size
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φ300mm×300mm
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Watch window
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φ100mm
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Chamber material
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Stainless steel
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Opening mode
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Top cover open
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Mass flowmeter
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2 channels; measuring range 100SCCM; 100SCCM (can be customized according to customer needs)
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Vacuum system
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Model
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OLT-GZK103-A
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Pumping interface
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KF40
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Molecular pump
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OLT-600
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Exhaust interface
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KF16
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Backing pump
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rotary vane pump
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Vacuum measurement
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Compound vacuum gauge
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Ultimate vacuum
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1.0E-5Pa
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Power supply
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AC;220V 50/60Hz
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Pumping rate
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Molecular pump: 600L/S rotary vane pump: 1.1L/S
Comprehensive gas pumping performance: vacuum up to 1.0E-3Pa in 20 minutes
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Power configuration
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Quantity
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DC power supply×2
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Max output power
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DC 500W
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Other parameters
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Supply voltage
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AC108V-240V,50Hz
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Overall size
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600mm×650mm×1280mm
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Total power
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2.5KW
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Total Weight
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About 300kg
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The coating machine is equipped with two-channel high-precision mass flowmeter. If you have other requirements, you can customize the gas path of up to four-channel mass flowmeters to meet the complex gas environment construction requirements. The instrument is equipped with advanced turbomolecular pump sets, the ultimate vacuum is up to 1.0E-5Pa, and other types of molecular pumps are available for purchase. Molecular pump gas path is controlled by multiple solenoid valves, you can open the chamber to take out the sample without shutting down the pump, greatly improving your work efficiency. This product can be equipped with an integrated industrial computer to control the system. In the computer program, most functions such as vacuum pump control and sputtering power control can be realized, which can further improve your experimental efficiency.
This device can be used for preparing single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, and the like. Compared with similar equipment, the dual-target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing material films in a laboratory.
