Application of TiSi2 powder:
Widely used in microelectronics, semiconductor, aerospace high temperature resistant material, coating materials, ceramic materials, ceramic target material, ect.
Specification of TiSi2 powder:
Size:1-3um
Purity:99.5%
Density:4.39g/cm3
Solubility: Soluble in hydrofluoric acid, insoluble in water
Note: We can supply different size products of HfSi2 powder according to client's requirements.
Titanium silicide is used in the semiconductor industry. It is typically grown by means of silicide technology over silicon and polysilicon lines to reduce the sheet resistance of local transistors connections. In the microelectronic industry it is typically used in the C54 phase.
Storage conditions:
TiSi2 powder should be sealed and stored in a dry and cool environment. It should not be exposed to the air for a long time, to prevent agglomeration due to moisture, affecting the dispersion performance and use effect, and should avoid heavy pressure, do not contact with oxidant, and transport according to ordinary goods.
