RF Power Supply for PECVD
The
PECVD system consists of a tube furnace, a quartz vacuum chamber, a vacuum
system, a gas supply system, and a radio frequency power supply system. Mainly
used for: growth of metal thin films, ceramic thin films, composite thin films,
graphene, etc. It is easy to add functions, and can expand functions such as
plasma cleaning and etching. The PECVD system has the advantages of high film
deposition rate, good uniformity, high consistency and stability.
Main technical parameters of RF power supply:
|
Power output range
|
0-500W
|
|
Maximum reflected
power
|
200W
|
|
working frequency
|
RF:13.56MHZ±0.005%
|
|
Power stability
|
+/-0.1%
|
|
Harmonic component
|
≤-50dbc
|
|
Rf region width
|
0-600mmadjustable
|
|
Matching way
|
automatic
|
|
Cooling mode
|
Points of cold
|
|
Noise
|
<50dB
|
|
Radio
frequency interface
|
50Ω N-type
|
|
Input power
|
208-240V 50/60HZ
|
1 Standard exported package: Internal anticollision protection, external export wooden box packaging.
2 Shipping by express, by air, by sea according to customers' requirements to find the most suitable way.
3 Responsible for the damage during the shipping process, will change the damage part for you for free.
