Product Details:
- The ULVAC RFS-13100U RF Generator is a radio frequency (RF) power supply designed for plasma applications, such as semiconductor etching and deposition processes. RF generators are used to provide the RF power required to generate and sustain a plasma in plasma-based processes.
- The ULVAC RFS-13100U RF generator provides a high-frequency alternating current (AC) signal in the radio frequency range, typically from 13.56 MHz up to several hundreds of MHz. This RF power is applied to an electrode, typically referred to as the "RF electrode" or "powered electrode," which is immersed in the plasma chamber. The RF power creates an electric field that ionizes the process gas, creating a plasma state.
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